Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots
نویسندگان
چکیده
SEP 2 7 2011 . RARIES B.S., Electrical Engineering, University of Sao Paulo (2008) ARCHIVES Submitted to the Department of Electrical Engineering and Computer Science in partial fulfillment of the requirements for the degree of Master of Science in Electrical Engineering and Computer Science at the MASSACHUSETTS INSTITUTE OF TECHNOLOGY September 2011 ( 2011 Massachusetts Institute of Technology. All rights reserved.
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